Explore nano-characterization and nano-fabrication techniques using electron beam (EB) and ion beam (IB) tools in this comprehensive lecture by Tomoko Borsa from the University of Colorado, Boulder. Delve into the nano-world, tracing the history of microscopy and semiconductor technology. Examine various lithography methods, including optical, electron beam, and focused ion beam lithography. Learn about the processes, applications, and limitations of these techniques in research environments. Discover practical examples of EB and IB applications, such as AFM probe modification, metal tip alteration, and precise sample preparation. Gain insights into the use of focused ion beam as both a fabrication and characterization tool, concluding with a demonstration of these cutting-edge technologies.