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1
Intro
2
Electron Beam Lithography
3
Substrate Choice
4
PMMA Resist
5
How do e-beam resists work?
6
Development
7
Results!
8
Dose Dependence
9
Resist Thickness
10
Substrate
11
Accelerating Voltage
12
Proximity Effect
13
Emission Current
14
SEM vs EBL
15
Fast Beam Blanker
16
PMMA dosing - Positive vs Negative resist
17
Next Steps
18
Curiosity Rover Wheel!
Description:
Explore the fascinating world of Electron Beam Lithography in this 25-minute video. Learn about drawing images with electrons using a scanning electron microscope. Discover the intricacies of substrate selection, PMMA resist application, and the working principles of e-beam resists. Delve into the development process and analyze results, examining factors such as dose dependence, resist thickness, substrate properties, and accelerating voltage. Understand the proximity effect, emission current, and the differences between SEM and EBL. Investigate fast beam blankers and the distinction between positive and negative PMMA dosing. Conclude with insights on future steps and a glimpse at the Curiosity Rover Wheel design.

Electron Beam Lithography - Drawing Images with Electrons

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